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Symposium Proceedings
Vol. 2012, Issue 1, 2012
January 01, 2012 EDT
Photostabilization of i-line Photoresist and ARC Layer
Zeliha YILMAZ
,
Murat PAK
,
Sema İMRAHORILYAS
,
Aylin ERSOY
,
lithography
photostabilization
i-line Photoresist
anti – reflecting coating
UV Bake
•
https://doi.org/10.4071/isom-2012-WA55
IMAPSource Conference Papers
YILMAZ, Zeliha, Murat PAK, Sema İMRAHORILYAS, and Aylin ERSOY. 2012. “Photostabilization of I-Line Photoresist and ARC Layer.”
IMAPSource Proceedings
2012 (1): 694–701.
https://doi.org/10.4071/isom-2012-WA55
.
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