The Impact of AI on Contact Resistance and Its Suitability in Fine Pitch Interconnects

Lie, Fee Li, Sathyanarayanan Raghavan, Eric Perfecto, Thomas Wassick, Conor Thomas, Heather Polgrean, Muthumanickam Sankarapandian, Cristina Estrada, and Jennifer Oakley. 2024. “The Impact of AI on Contact Resistance and Its Suitability in Fine Pitch Interconnects.” IMAPSource Proceedings 2023 (Symposium): 21–26. https:/​/​doi.org/​10.4071/​001c.94298.