Understanding photoresist - electroplating bath interactions using HPLC methodology

I. Popova; R. Dieckmann; N. Schroeder; G. Gomes; J. Golden

doi:10.4071/1085-8024-2021.1.000368

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Popova, I., R. Dieckmann, N. Schroeder, G. Gomes, and J. Golden. 2021. “Understanding Photoresist - Electroplating Bath Interactions Using HPLC Methodology.” IMAPSource Proceedings 2021 (IMAPS Symposium): 368–75. https://doi.org/10.4071/1085-8024-2021.1.000368.

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