Vol. 2016, Issue CICMT, 2016May 01, 2016 EDT
Thermodynamic Analysis of Physical Vapor Deposition (PVD) Inorganic Thin Films on Low Temperature Cofired Ceramic (LTCC)
Thermodynamic Analysis of Physical Vapor Deposition (PVD) Inorganic Thin Films on Low Temperature Cofired Ceramic (LTCC)
Carol Putman, Rachel Cramm Horn, Ambrose Wolf, Daniel Krueger,
Putman, Carol, Rachel Cramm Horn, Ambrose Wolf, and Daniel Krueger. 2016. “Thermodynamic Analysis of Physical Vapor Deposition (PVD) Inorganic Thin Films on Low Temperature Cofired Ceramic (LTCC).” IMAPSource Proceedings 2016 (CICMT): 175–82. https://doi.org/10.4071/2016CICMT-THA13.