Vol. 2018, Issue 1, 2018October 01, 2018 EDT
Optimization of Cupric Chloride Subtractive Etching for Cu High Density Interconnects
Optimization of Cupric Chloride Subtractive Etching for Cu High Density Interconnects
Lambert, Alexander, Goutham Issac, Ashish Salunke, Luwen Lu, and Oliver Chyan. 2018. “Optimization of Cupric Chloride Subtractive Etching for Cu High Density Interconnects.” IMAPSource Proceedings 2018 (1): 640–46. https://doi.org/10.4071/2380-4505-2018.1.000640.