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Symposium Proceedings
Vol. 2016, Issue 1, 2016October 01, 2016 EDT

Correlation of Through-silicon Via (TSV) Dimension Scaling to TSV Stress and Reliability for 3D Interconnects

Laura Spinella, Jang-Hi Im, Paul S. Ho, Tengfei Jiang,
ExtrusionMicrostructureReliabilityScalingStressTSV
https://doi.org/10.4071/isom-2016-WA22
IMAPSource Conference Papers
Spinella, Laura, Jang-Hi Im, Paul S. Ho, and Tengfei Jiang. 2016. “Correlation of Through-Silicon Via (TSV) Dimension Scaling to TSV Stress and Reliability for 3D Interconnects.” IMAPSource Proceedings 2016 (1): 160–64. https:/​/​doi.org/​10.4071/​isom-2016-WA22.

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