Influence of film thicknesses on the electrical properties of RuO2-thick film resistors on aluminum nitride ceramics (AlN)

Richard Schmidt; Christel Kretzschmar; Markus Eberstein

doi:10.4071/isom-2011-TA3-Paper1

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Schmidt, Richard, Christel Kretzschmar, and Markus Eberstein. 2011. “Influence of Film Thicknesses on the Electrical Properties of RuO2-Thick Film Resistors on Aluminum Nitride Ceramics (AlN).” IMAPSource Proceedings 2011 (1): 77–82. https://doi.org/10.4071/isom-2011-TA3-Paper1.

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