ISSN 2380-4505
Vol. 2024, Issue HiTEN, 2024January 27, 2026 EDT
Investigation of Ohmic Contacts and Resistances of a 4H-SiC CMOS Technology up to 550°C
Investigation of Ohmic Contacts and Resistances of a 4H-SiC CMOS Technology up to 550°C
Rommel, Mathias, Alexander May, Leander Baier, Julian Kauth, Norman Böttcher, and Michael Jank. 2026. “Investigation of Ohmic Contacts and Resistances of a 4H-SiC CMOS Technology up to 550°C.” IMAPSource Proceedings 2024 (HiTEN): 13–18. https://doi.org/10.4071/001c.155879.