ISSN 2380-4505
Vol. 2020, Issue DPC, 2020April 24, 2024 EDT
Enabling Fine Line RDL and High Aspect Ratios for CU Pillars for Heterogeneous Integration
Enabling Fine Line RDL and High Aspect Ratios for CU Pillars for Heterogeneous Integration
Benthaus, Fabian, Habib Hichri, Markus Arendt, and Matthew Gingerella. 2024. “Enabling Fine Line RDL and High Aspect Ratios for CU Pillars for Heterogeneous Integration.” IMAPSource Proceedings 2020 (DPC): 306–40. https://doi.org/10.4071/001c.116981.