Enabling Fine Line RDL and High Aspect Ratios for CU Pillars for Heterogeneous Integration

Fabian Benthaus; Habib Hichri; Markus Arendt; Matthew Gingerella

doi:10.4071/001c.116981

Benthaus, Fabian, Habib Hichri, Markus Arendt, and Matthew Gingerella. 2024. “Enabling Fine Line RDL and High Aspect Ratios for CU Pillars for Heterogeneous Integration.” IMAPSource Proceedings 2020 (DPC): 306–40. https://doi.org/10.4071/001c.116981.

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Enabling Fine Line RDL and High Aspect Ratios for CU Pillars for Heterogeneous Integration

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