Vol. 2023, Issue HiTEC, CICMT, Power, 2023October 17, 2023 EDT
Shadow masks as an alternative method to lithography for the structuring of thin film layers on LTCC substrates
Shadow masks as an alternative method to lithography for the structuring of thin film layers on LTCC substrates
Bartsch, Heike, Nesrine Jaziri, Konrad Jaekel, Norayr Nessimian, and Jens Müller. 2023. “Shadow Masks as an Alternative Method to Lithography for the Structuring of Thin Film Layers on LTCC Substrates.” IMAPSource Proceedings 2023 (HiTEC, CICMT, Power): 1–4. https://doi.org/10.4071/001c.89092.