UV Projection Scanner Performance in Thick Resists for High Aspect Ratio Cu Pillars

William Vis; Fabian Benthaus; Habib Hichri; Markus Arendt

doi:10.4071/2380-4491-2019-DPC-Presentation_TP1_063

Loading [Contrib]/a11y/accessibility-menu.js

Vis, William, Fabian Benthaus, Habib Hichri, and Markus Arendt. 2019. “UV Projection Scanner Performance in Thick Resists for High Aspect Ratio Cu Pillars.” IMAPSource Proceedings 2019 (DPC): 314–37. https://doi.org/10.4071/2380-4491-2019-DPC-Presentation_TP1_063.

View more stats