Application of Low-k Liner for Stress and Capacitance Control in Cu-TSV

C. S. Tan; L. Zhang; H.Y. Li; W. Yoo

doi:10.4071/isom-2013-TA15

Tan, C. S., L. Zhang, H.Y. Li, and W. Yoo. 2013. “Application of Low-k Liner for Stress and Capacitance Control in Cu-TSV.” IMAPSource Proceedings 2013 (1): 17–21. https://doi.org/10.4071/isom-2013-TA15.

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